The semiconductor ultra high purity (UHP) nitrogen generator is a grade-1 clean gas supply system designed for full-process wafer fabrication, photolithography, etching, ion implantation, chip packaging and semiconductor testing processes, delivering ultra-high-purity nitrogen reaching 99.9999% (6N) purity that meets SEMI international semiconductor gas standards. Different from ordinary industrial nitrogen equipment, this generator integrates four core processing units: primary air compression grade purification, pressure swing adsorption primary separation, catalytic deoxidation deep purification and cryogenic membrane fine filtration. It removes trace impurities including residual oxygen, carbon monoxide, carbon dioxide, hydrocarbon compounds, moisture and airborne 0.01μm fine particles that are fatal to semiconductor chips. Even trace oxygen above 1ppb will cause circuit oxidation, wafer surface scratch and photoresist failure during chip manufacturing, so this UHP model maintains impurity content stably below 0.1ppb to adapt to 7nm, 14nm and advanced 28nm chip production workshops.
Cleanliness stability and ultra-precise gas control are the core design advantages of this semiconductor dedicated nitrogen generator. The whole gas pipeline adopts electrolytic polished 316L stainless steel seamless pipe with zero internal dead angle, equipped with vacuum valve components and fully sealed negative-pressure air intake structure to prevent external ambient gas backflow pollution. The independent constant-temperature workshop operating system isolates equipment from workshop temperature and humidity changes, avoiding purity fluctuation caused by seasonal environmental variations. It configures imported online trace oxygen analyzers, dew point detectors and particle counters, uploading real-time gas quality data to fab central control system for 24-hour data traceability, which meets semiconductor factory intelligent production audit and quality filing requirements. The modular stacked structure saves clean room floor space, supporting flexible capacity expansion for semiconductor production line capacity upgrading without overall equipment replacement.
This ultra high purity nitrogen generator covers all core nitrogen application scenarios in semiconductor manufacturing. It serves as carrier gas for photolithography machine reagent delivery, inert protection gas for high-temperature diffusion furnaces, purging gas for wafer cavity cleaning, and dry storage gas for finished chip packaging, preventing wafer surface oxidation, circuit corrosion and electrostatic particle adhesion throughout production. Replacing traditional outsourced bottled UHP nitrogen and liquid nitrogen tank supply, the on-site generation model avoids secondary pollution generated during tanker transportation and pipeline transfer, and cuts comprehensive gas procurement cost by 75% for semiconductor fabs. The equipment adopts oil-free screw air compressor full-process oil-free air supply design, with -70℃ ultra-low stable dew point, Class 100 internal cleanliness and emergency uninterrupted gas switching module to guarantee zero gas outage during key chip processing procedures. It has become standard supporting equipment for integrated circuit fabs, photoelectric chip factories and semiconductor material research laboratories worldwide.
